Theory and Application of Laser Chemical Vapor Deposition by Jyoti Mazumder, Aravinda Kar (auth.)

By Jyoti Mazumder, Aravinda Kar (auth.)

In this monograph, the authors provide a complete exam of the most recent examine on Laser Chemical Vapor Deposition (LCVD). Chapters discover the physics of LCVD in addition to the rules of a variety of comparable phenomena-including laser-matter interactions, warmth move, fluid stream, chemical kinetics, and adsorption. With this reference, researchers will detect how you can observe those rules to constructing theories approximately a number of varieties of LCVD methods; achieve better perception into the elemental mechanisms of LCVD; and acquire the facility to layout and keep an eye on an LCVD system.

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By Jyoti Mazumder, Aravinda Kar (auth.)

In this monograph, the authors provide a complete exam of the most recent examine on Laser Chemical Vapor Deposition (LCVD). Chapters discover the physics of LCVD in addition to the rules of a variety of comparable phenomena-including laser-matter interactions, warmth move, fluid stream, chemical kinetics, and adsorption. With this reference, researchers will detect how you can observe those rules to constructing theories approximately a number of varieties of LCVD methods; achieve better perception into the elemental mechanisms of LCVD; and acquire the facility to layout and keep an eye on an LCVD system.

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Photoinduced epitaxy-refers to the process where deposition does not occur outside the laser-irradiated region. Boyd (1989) has discussed the role of LCVD in doping semiconductors and producing Si0 2 for fabricating microelectronic devices. Usually, ion implantation is used for doping purposes, but this technique requires a high-temperature annealing cycle to rebuild the sample surface to its original crystalline perfection. Such high temperatures can affect the properties of the underlayers and other devices that might be present in the wafer.

1988) passivated GaAs MESFET (metal semiconductor field effect transistor) by depositing Si3N4 film using Hg as the photosensitizer and a set of UV lamps for photochemical activation of Hg and the reactants (NH3 and SiH4). GaAs MESFETs are used for signal processing, communications, displays, remote controls, and other highfrequency systems. involving the microwave region of the electromagnetic 42 CHAPTER ONE spectrum. However, the degradation in device characteristics due to the changes in channel thickness and channel surface is the major problem with such transistors.

The small polyatomic molecules have discrete vibrational and rotational states at low energies, and an intense laser beam is required to 28 CHAPTER ONE excite the molecules through these discrete states via resonant absorption. Owing to the absorption of photons, the vibrational levels become anharmonic; that is, the spacings between the vibrational energy levels become unequal, leading to closer spacings between higher vibrational levels. This hinders the multiphoton excitation process, because the laser, which is tuned for the lowest vibrational energy transition, falls out of resonance for higher transitions.

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